Found 16 resultsAuthor Title [ Type] Year
Filters: Author is Veprek, S [Clear All Filters]
Scrape-off measurements during Alfvén wave heating in the TCA tokamak. Journal of Nuclear Materials 121, 22–28 (1984).
Scanning tunneling microscopy of nanocrystalline silicon surfaces. Surface Science 168, 795–800 (1986).
Properties of microcrystalline silicon. IV. Electrical conductivity, electron spin resonance and the effect of gas adsorption. Journal of Physics C: Solid State Physics 16, 6241 (1983).
A novel method for the determination of the energies of impurity ions bombarding a solid surface exposed to a low pressure plasma. Journal of Vacuum Science & Technology A 2, 35–39 (1984).
Investigation of the initial stages of oxidation of microcrystalline silicon by means of X-ray photoelectron spectroscopy. Solid state communications 47, 747–751 (1983).
Investigation of impurity retention, implantation and sputtering phenomena on au and c surfaces exposed to the scrape-off-layer. Journal of Nuclear Materials 128, 703–704 (1984).
Impurity recycling and retention on Au and C surfaces exposed to the scrape-off layer of the TCA tokamak. Journal of Vacuum Science & Technology A 4, 90–96 (1986).
Impurity deposition profiles in the plasma edge of the TCA Tokamak. Physica Scripta 30, 271 (1984).
Hydrogen trapping in zirconium under plasma conditions. Journal of Nuclear Materials 128, 705–707 (1984).
Effect of surface contamination and pretreatment on the hydrogen diffusion into and out of titanium under plasma conditions. Journal of Nuclear Materials 103, 465–469 (1981).
Boron and doped boron first wall coatings by plasma CVD. Journal of Nuclear Materials 103, 257–260 (1981).
BORON AND DOPED BORON 1ST WALL COATINGS BY PLASMA CVD. JOURNAL OF NUCLEAR MATERIALS 103, 257–260 (1982).
PROPERTIES OF MICROCRYSTALLINE SILICON-ELECTRICAL-CONDUCTIVITY, ELECTRON-SPIN RESONANCE AND THE EFFECT OF GAS-ADSORPTION. HELVETICA PHYSICA ACTA 55, 161–161 (BIRKHAUSER VERLAG AG PO BOX 133 KLOSTERBERG 23, CH-4010 BASEL, SWITZERLAND, 1982).
DETERMINATION OF THE ENERGIES OF IMPURITY IONS IN A LOW-PRESSURE PLASMA USING PLASMA CHEMICAL ETCHING. HELVETICA PHYSICA ACTA 56, 959–960 (BIRKHAUSER VERLAG AG PO BOX 133 KLOSTERBERG 23, CH-4010 BASEL, SWITZERLAND, 1983).